The design of the Low Pressure Chemical Vapor Deposition furnaces combines the multiple process capability with the needs of a maximum capacity for full production system and high flexibility small scale versions for use in research and pilot production. Horizontal LPCVD Furnace provides an easy-to-maintain, safe and reliable horizontal furnace platform.
The design of the Low Pressure Chemical Vapor Deposition furnaces combines the multiple process capability with the needs of a maximum capacity for full production system and high flexibility small scale versions for use in research and pilot production. Horizontal LPCVD Furnace provides an easy-to-maintain, safe and reliable horizontal furnace platform.
The design is outstanding for high efficiency, minimised footprint and low cost of ownership while offering high process flexibility.
LPCVD Processes
Silicon nitride
Low temperature oxide (LTO)
High temperature oxide (HTO)
TEOS oxide
Polysilicon, both with tilt andflat temperature profile
Doped polysilicon
Oxynitride
Features and Benefits of Horizontal LPCVD Furnace
State of the art modular control system; in-house designed, highly tailored and in-house manufactured
Top notch components always selected for excellent results and trouble free long life of the furnace equipment
Up to 4 stacked quartz tube reactor chambers for various procesess
Multiple methods of vacuum control, heated or unheated
Throttling Buttefly Valve – TBV
N₂ ballast
Vacuum pump control with frequency converter
Integration of vacuum pump system in cooperation with leading vacuum pump manufacturers
Advanced water cooling tube level system: no thermal interference between different tubes
Proprietary designed water cooled flanges
Contactless fully automated boat-in-tube loading both cantilever or softloading configurations
Maintenance friendly mechanical design
The design of the Low Pressure Chemical Vapor Deposition furnaces combines the multiple process capability with the needs of a maximum capacity for full production system and high flexibility small scale versions for use in research and pilot production. Horizontal LPCVD Furnace provides an easy-to-maintain, safe and reliable horizontal furnace platform.
The design is outstanding for high efficiency, minimised footprint and low cost of ownership while offering high process flexibility.
LPCVD Processes
Silicon nitride
Low temperature oxide (LTO)
High temperature oxide (HTO)
TEOS oxide
Polysilicon, both with tilt andflat temperature profile
Doped polysilicon
Oxynitride
Features and Benefits of Horizontal LPCVD Furnace
State of the art modular control system; in-house designed, highly tailored and in-house manufactured
Top notch components always selected for excellent results and trouble free long life of the furnace equipment
Up to 4 stacked quartz tube reactor chambers for various procesess
Multiple methods of vacuum control, heated or unheated
Throttling Buttefly Valve – TBV
N₂ ballast
Vacuum pump control with frequency converter
Integration of vacuum pump system in cooperation with leading vacuum pump manufacturers
Advanced water cooling tube level system: no thermal interference between different tubes
Proprietary designed water cooled flanges
Contactless fully automated boat-in-tube loading both cantilever or softloading configurations
Maintenance friendly mechanical design
