STA manufacture all kinds of electric furnace for different types of LPCVD furnaces, Full name is low pressure chemical vapor deposition furnace, such as diffusion furnaces.
Low Pressure Chemical Vapor Deposition (LPCVD) is a thermal process that deposits various films at low pressure. Diffusion (sometimes referred to as annealing) is a thermal treatment used to move dopants, or impurities, and make dopants introduced by ion implantation electrically active.
Our Advance Series Vertical Furnaces provide a wide range of high-productivity batch processing solutions for Diffusion, Oxidation, Anneal, Cure and LPCVD. In addition, ALD capability is available for the Advance furnaces further exploiting the benefits of their batch productivity.
